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We, Nippon Aluminum Alkyls, Ltd., provide customers worldwide safely and stably with high-quality aluminum alkyls. Our main products are Catalysts for polymerization of synthetic resins and Fine Organometallics.

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Mitsui Chemicals, Inc.


Albemarle Corporation


Catalyst Manufacturers
Association (JAPAN)

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We, Nippon Aluminum Alkyls, Ltd., provide customers worldwide safely and stably with high-quality aluminum alkyls. Our main products are Catalysts for polymerization of synthetic resins and Fine Organometallics.

 

 

 

Organometallics and their hydrides are very useful to promote smart synthesis of pharmaceuticals. Nippon Aluminum Alkyls, Ltd. (NAA) manufactures and supplies the following organometallics in commercial scale.

[ NAA Organometallic Products for Pharmaceuticals ]  
1. DIBAH (Diisobutyl Aluminium Hydride) (i-C4H9)2AlH
2. DEZ (Diethyl Zinc) (C2H5)2Zn
3. TBB (Tributyl Boron) (C4H9)3B
4. TMA (Trimethyl Aluminium) (CH3)3Al
5. TEA (Triethyl Aluminium) (C2H5)3Al
6. DMAH(Dimethyl Aluminium Hydride) (CH3)2AlH

[ Examples of application ]

 

1.DIBAH

2.DEZ

   

Many kinds of organometallics such as aluminium alkyls are used for MOCVD ( Metal Organic Chemical Vapor Deposition ) systems and in support of semi-conductor manufacturing.

Among NAA's organometallics products, there are some compounds used for MOCVD systems and as raw material for contact material between copper and silicon in semi-conductor


solar panels

[ NAA's organometallics for electronics and information materials ]

Products Application
Triethylaluminium (TEAL) Raw material for AlN and TEG
Trimethylaluminium (TMA) Raw material for TMG
Diethylzinc (DEZ) Raw material for ZnO thin film for solar cell
Dimethylaluminiumhydride(DMAH) Raw material for contact between copper and silicon in semi-conductor

    Dimethylaluminium hydride@(DMAHj@Al(CH3)2H

 

        Dimethylaluminium hydride, DMAH, is an Al-centered organometallic compound with two

       methyl groups and one hydride directly connecting to Al atom.  DMAH is known to be an

       advantageous MOCVD precursor for a formation of Al thin film on semiconductor devices,

       since it is easily decomposed under relatively mild conditions with low carbon contamination

       in the film.

       We expect DMAH to be more widely utilized in the field of the semiconductor manufacture.

 

      Reference

       (1) He, Gang; Deng, Bin et al, Sci. Adv. Mater. (2013), 5(6), 709-712.

       (2) He, Gang; Sun, Zhaoqi et al, J. Mater. Chem. (2012), 22(15), 7468-7477. 

       (3) Lu, Hong-Liang; Wang, Xiao-Liang et al, Appl. Phys. Lett. (2009), 95(21), 212102/1-212102/3  

       (4) Miyajima, Shinsuke; Yamada, Akira et al, Jpn. J. Appl. Phys. (2007), 46(4A), 1415-1426.

       (5) Imaizum, Yoshiaki; Mekaru, Harutaka; Urisu, Tsuneo, Appl. Organometal. Chem. (1999),

             13(3), 195-200.

       (6) Sugai, Kazumi; Kishida, Shunji et al, J. Electrochem. Soc. (1997), 144(3), 1028-1035.

        (7) Kondoh, Eiichi; Kawano, Yumiko et al, J. Electrochem. Soc. (1994), 141(12), 3494-3499.

        (8) Tsubouchi, Kazuo; Masu, Kazuya, Kotai-Butsuri (1994), 29(7), 599-605.

        (9) Tsubouchi, Kazuo; Masu, Kazuya, Ouyou-Butsuri (1993), 62(12), 1225-1229.

@@   (10) Tani, Kouichi; Nishikawa, Satoshi, Jpn. J. Appl. Phys. (1994), 33(1B), 455-458.

        (11)Takeyasu, Nobuyuki; Kawano, Yumiko et al, Jpn. J. Appl. Phys. (1994), 33(1B), 424-428.

        (12) Kawai, Takao; Hanabusa, Mitsugu, Jpn. J. Appl. Phys. (1993), 32(10), 4690-4693.

        (13) Ohashi, Masafumi; Shogen, Satoshi et al, J. Appl. Phys. (1993), 73(7), 3549-3554.

@@   (14) Tsubouchi, Kazuo; Masu, Kazuya et al, Jpn. J. Appl. Phys. (1993), 32(1B), 278-281.

        (15) Uesugi, Fumihiko; Nishiyama, Iwao, Appl. Surf. Sci. (1992), 62(3), 151-156.

@  @ (16 )Uesugi, Fumihiko; Nishiyama, Iwao, Appl. Surf. Sci. (1992), 60-61, 587-591.

        (17) Zhu, Nongfan; Cacouris, Ted et al, J. Vac. Sci. Technol.B? (1992), 10(3), 1167-1176.

@@   (18) Hanabusa, Mitsuga; Ikeda, Masashi, Appl. Organometal. Chem (1991), 5(4), 289-293.

        (19) Tsubouchi, Kazuo; Masu, Kazuya et al, Appl. Phys. Lett. (1990), 57(12), 1221-1223.

We, Nippon Aluminum Alkyls, Ltd., provide customers worldwide safely and stably with high-quality aluminum alkyls. Our main products are Catalysts for polymerization of synthetic resins and Fine Organometallics.

 

 

 

 
 
We provide customers worldwide safely and stably with high-quality aluminium alkyls.